| Data Processing in XPS/ESCA and AES (1 day) | |||||||
| XPS and AES are used to determine the atoms present at a surface, and their concentrations, chemistries, and lateral and depth distributions. This course will show attendees how to process and evaluate XPS and AES spectra: | |||||||
| • | Spectra ö the many features present in spectra will be described. | ||||||
| • | Background subtraction methods will be described and compared. | ||||||
| • | Shapes of peaks will be described and approaches for curve fitting will be illustrated. | ||||||
| • | Approaches for quantitative analysis will be demonstrated and errors illustrated. | ||||||
| • | Data processing methods to improve images will be demonstrated. | ||||||
| • | Data processing methods for near-surface, non-destructive depth profiling will be illustrated. | ||||||
| • | Data processing methods to remove peak overlap problems, separate different chemical states, and improve signal-to-noise in sputter depth profiles will be demonstrated. | ||||||
| • | Spectra ö the many features present in spectra will be described. | ||||||
| Hours: 8:30 am-5pm, Lunch on your own | |||||||
| Printed notes will be provided to participants | |||||||