| |
|
|
|
|
|
|
|
|
|
|
|
| Device
Fabrication and Characterization Laboratory
Prof. Mark Lonergan |
| |
|
|
|
|
|
|
|
| |
The
semiconductor device physics and chemistry laboratory houses photolithography,
high-vacuum deposition, and other semiconductor device processing
equipment as well as instrumentation for the electrical characterization
of materials.
|
|
|
| |
Clean
and Etch Lab: |
|
| |
• |
The
Clean and Etch Lab is a 400 sq. ft. wet lab with 2 x 6' fume hoods, outfitted
with equipment for preparing and etching wafers. |
|
| |
|
|
|
| |
2
Lithography Yellowrooms: |
|
| |
• |
Darkroom
with fume hood and wet lab space for preparing and developing lithographically
defined patterns on silicon and other substrates. |
|
| |
• |
Headway
Research Spin Coater |
|
| |
• |
OAI Model 200 Contact
Mask Aligner
|
|
| |
• |
Softbake
hotplates, hardbake oven and ultrasonic bath |
|
| |
|
|
|
| |
Electron
Beam Lithography |
|
| |
|
J.
Nabbity electon beam lithography pattern generator used with JEOL JSm-6300V
scanning electron microscope |
|
| |
|
|
|
| |
Diffusion/Oxidation
equipment includes: |
|
| |
• |
Chem
Mat Spin Coater |
|
| |
• |
2
dry oxide tube furnaces |
|
| |
• |
2
wet oxide tube furnaces |
|
| |
• |
2
boron diffusion tube furnaces |
|
| |
|
|
|
| |
Thin
Film Deposition: |
|
| |
• |
For
thin film deposition, the lab houses a key diffusion-pumped vacuum bell
jar evaporator with an Infinicon quartz crystal deposition monitor |
|
| |
|
|
|
| |
Characterization
and Testing: |
|
| |
• |
Inspection
microscopes (one with computer-interfaced color CCD camera) |
|
| |
• |
Four-point
probe station, current source, and DVM for resistivity measurements |
|
| |
• |
Allesi
probe station/inspection microscope |
|
| |
• |
Filmetrics
– for film thickness measurements |
|
| |
• |
4
Keithley Source-Measure Units – for current-voltage measurements |
|
| |
• |
2
Agilent Precision LCR Meters – for capacitance-voltage measurements
|
|
| |
• |
Reactive
Ion Etcher |
|
| |
• |
Wire
Bonder |
|
| |
• |
Stylus
Profilometer |
|
|
|
